{"id":22537,"date":"2026-03-04T09:45:48","date_gmt":"2026-03-04T08:45:48","guid":{"rendered":"https:\/\/www.m-q.ch\/?p=22537"},"modified":"2026-03-04T09:45:48","modified_gmt":"2026-03-04T08:45:48","slug":"mieux-detecter-la-contamination-des-wafers","status":"publish","type":"post","link":"https:\/\/www.m-q.ch\/fr\/mieux-detecter-la-contamination-des-wafers\/","title":{"rendered":"Mieux d\u00e9tecter la contamination des wafers"},"content":{"rendered":"
\"\"
Tube de balayage avec goutte entra\u00een\u00e9e et tranche de silicium en rotation pour l'analyse de surface. (Image : Fraunhofer IPMS)<\/figcaption><\/figure>\n

Les wafers sont de fines tranches circulaires de mat\u00e9riau semi-conducteur qui servent de base \u00e0 la fabrication de micro-puces et d'autres composants \u00e9lectroniques. La qualit\u00e9 et la puret\u00e9 de la surface des wafers sont d\u00e9terminantes pour la fonctionnalit\u00e9 et la performance des produits finaux. Diff\u00e9rentes m\u00e9thodes de caract\u00e9risation sont utilis\u00e9es pour d\u00e9tecter et quantifier les contaminations. Celles-ci ont maintenant \u00e9t\u00e9 \u00e9tendues \u00e0 l'IPMS Fraunhofer par l'analyse des \u00e9l\u00e9ments \u00e0 ultra-traces. Pour ce faire, apr\u00e8s la gravure de wafers de 200 ou 300 mm avec de la vapeur HF (acide fluorhydrique), une goutte est d\u00e9pos\u00e9e sur la surface du wafer et d\u00e9plac\u00e9e sur celle-ci. La goutte recueille les r\u00e9sidus solubles pr\u00e9sents \u00e0 la surface et est ensuite remplie jusqu'\u00e0 un volume de 1 ml. Au moyen de la spectrom\u00e9trie de masse \u00e0 plasma \u00e0 couplage inductif (ICP-MS), les \u00e9l\u00e9ments dissous sont ensuite analys\u00e9s. Le proc\u00e9d\u00e9 fournit ainsi des informations quantitatives pr\u00e9cises sur les \u00e9l\u00e9ments dissous \u00e0 la surface du wafer.<\/p>\n

L'analyse des \u00e9l\u00e9ments \u00e0 l'\u00e9tat d'ultra-traces offre des possibilit\u00e9s \u00e9tendues : Ainsi, des scans de surface et de bevel sont effectu\u00e9s pour analyser 39 \u00e9l\u00e9ments avec une solution de scan HF, ce qui permet une caract\u00e9risation d\u00e9taill\u00e9e de la surface des wafers. Pour des applications sp\u00e9ciales, il est en outre possible d'utiliser de l'eau r\u00e9gale comme solution de scannage pour cinq m\u00e9taux pr\u00e9cieux.<\/p>\n

\u00c9quipement de laboratoire \u00e0 l'IPMS Fraunhofer<\/strong><\/h3>\n

Le laboratoire est \u00e9quip\u00e9 d'un mat\u00e9riel de pointe, dont l'installation VPD Wafer Surface Preparation System WSPS2 de PVA Tepla et le spectrom\u00e8tre de masse iCap RQ de Thermo Scientific. Ces technologies permettent une caract\u00e9risation pr\u00e9cise et une assurance qualit\u00e9 dans l'industrie des semi-conducteurs. Avec cette extension, l'IPMS Fraunhofer consolide sa position d'institut de recherche de premier plan dans le domaine du traitement des wafers de 300 mm et contribue \u00e0 l'am\u00e9lioration de la qualit\u00e9 de production dans la fabrication des semi-conducteurs.<\/p>\n

Source : Fraunhofer IPMS<\/a><\/em><\/p>","protected":false},"excerpt":{"rendered":"

L'Institut Fraunhofer pour les microsyst\u00e8mes photoniques IPMS \u00e9largit ses capacit\u00e9s d'analyse dans le domaine de la contamination des wafers. Dans un laboratoire d\u00e9di\u00e9, la m\u00e9thode \u00e9tablie de d\u00e9composition en phase vapeur est utilis\u00e9e \u00e0 cet effet en combinaison avec la spectrom\u00e9trie de masse \u00e0 plasma coupl\u00e9 par induction (VPD-ICP-MS). Il est ainsi possible de surveiller avec pr\u00e9cision la contamination de la surface des wafers. <\/p>","protected":false},"author":10,"featured_media":22538,"comment_status":"closed","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"_acf_changed":false,"footnotes":""},"categories":[3303],"tags":[3591,5295,5941,3327,5940],"class_list":["post-22537","post","type-post","status-publish","format-standard","has-post-thumbnail","hentry","category-qualitaetsmanagement","tag-fraunhofer","tag-labortechnik","tag-mikroelektronik","tag-qualitaetsmanagement","tag-waferherstellung"],"acf":[],"yoast_head":"\nKontamination von Wafern besser erkennen - MQ Management und Qualit\u00e4t<\/title>\n<meta name=\"description\" content=\"Das Fraunhofer-Institut f\u00fcr Photonische Mikrosysteme IPMS erweitert seine Analysef\u00e4higkeiten im Bereich der Waferkontamination.\" \/>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/www.m-q.ch\/fr\/mieux-detecter-la-contamination-des-wafers\/\" \/>\n<meta property=\"og:locale\" content=\"fr_FR\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"Kontamination von Wafern besser erkennen\" \/>\n<meta property=\"og:description\" content=\"Das Fraunhofer-Institut f\u00fcr Photonische Mikrosysteme IPMS erweitert seine Analysef\u00e4higkeiten im Bereich der Waferkontamination.\" \/>\n<meta property=\"og:url\" content=\"https:\/\/www.m-q.ch\/fr\/mieux-detecter-la-contamination-des-wafers\/\" \/>\n<meta property=\"og:site_name\" content=\"MQ Management und Qualit\u00e4t\" \/>\n<meta property=\"article:publisher\" content=\"https:\/\/www.facebook.com\/ManagementUndQualitaet\" \/>\n<meta property=\"article:published_time\" content=\"2026-03-04T08:45:48+00:00\" \/>\n<meta property=\"og:image\" content=\"https:\/\/www.m-q.ch\/wp-content\/uploads\/2026\/03\/Kontamination-von-Wafern-besser-erkennen_MQ.jpg\" \/>\n\t<meta property=\"og:image:width\" content=\"680\" \/>\n\t<meta property=\"og:image:height\" content=\"510\" \/>\n\t<meta property=\"og:image:type\" content=\"image\/jpeg\" \/>\n<meta name=\"author\" content=\"Thomas Berner\" \/>\n<meta name=\"twitter:card\" content=\"summary_large_image\" \/>\n<meta name=\"twitter:title\" content=\"#Kontamination von #Wafern besser erkennen\" \/>\n<meta name=\"twitter:description\" content=\"Das Fraunhofer-Institut f\u00fcr Photonische Mikrosysteme #IPMS erweitert seine Analysef\u00e4higkeiten im Bereich der #Waferkontamination.\" \/>\n<meta name=\"twitter:image\" content=\"https:\/\/www.m-q.ch\/wp-content\/uploads\/2026\/03\/Kontamination-von-Wafern-besser-erkennen_MQ.jpg\" \/>\n<meta name=\"twitter:label1\" content=\"\u00c9crit par\" \/>\n\t<meta name=\"twitter:data1\" content=\"Thomas Berner\" \/>\n\t<meta name=\"twitter:label2\" content=\"Dur\u00e9e de lecture estim\u00e9e\" \/>\n\t<meta name=\"twitter:data2\" content=\"2 minutes\" \/>\n<script type=\"application\/ld+json\" class=\"yoast-schema-graph\">{\"@context\":\"https:\/\/schema.org\",\"@graph\":[{\"@type\":\"Article\",\"@id\":\"https:\/\/www.m-q.ch\/kontamination-von-wafern-besser-erkennen\/#article\",\"isPartOf\":{\"@id\":\"https:\/\/www.m-q.ch\/kontamination-von-wafern-besser-erkennen\/\"},\"author\":{\"name\":\"Thomas Berner\",\"@id\":\"https:\/\/www.m-q.ch\/fr\/#\/schema\/person\/a8711938b1cfb3f056dec70eaa0b42ab\"},\"headline\":\"Kontamination von Wafern besser erkennen\",\"datePublished\":\"2026-03-04T08:45:48+00:00\",\"mainEntityOfPage\":{\"@id\":\"https:\/\/www.m-q.ch\/kontamination-von-wafern-besser-erkennen\/\"},\"wordCount\":297,\"publisher\":{\"@id\":\"https:\/\/www.m-q.ch\/fr\/#organization\"},\"image\":{\"@id\":\"https:\/\/www.m-q.ch\/kontamination-von-wafern-besser-erkennen\/#primaryimage\"},\"thumbnailUrl\":\"https:\/\/www.m-q.ch\/wp-content\/uploads\/2026\/03\/Kontamination-von-Wafern-besser-erkennen_MQ.jpg\",\"keywords\":[\"Fraunhofer\",\"Labortechnik\",\"Mikroelektronik\",\"Qualit\u00e4tsmanagement\",\"Waferherstellung\"],\"articleSection\":[\"Qualit\u00e4tsmanagement\"],\"inLanguage\":\"fr-FR\"},{\"@type\":\"WebPage\",\"@id\":\"https:\/\/www.m-q.ch\/kontamination-von-wafern-besser-erkennen\/\",\"url\":\"https:\/\/www.m-q.ch\/kontamination-von-wafern-besser-erkennen\/\",\"name\":\"Kontamination von Wafern besser erkennen - 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